[Cast10] Invitation to submit a process control paper for Osaka July 06 Symposium

From: michael gevelber (gevelber@bu.edu)
Date: Wed Jan 04 2006 - 09:21:04 EST

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    Please consider submitting an abstract to the process control session
    for advanced manufacturing and materials processing that I am running
    at the next
    International Symposium on Flexible Automation to be held In Osaka
    Japan July 10-12 2006 (see note below for further details on this
    session).

    See instructions for submitting a paper at
    (http://pmrc.marc.gatech.edu/isfa2006/ )
    Extended abstracts/draft papers are due January 20th.

    Please forward this to others you feel might be interested. Thank you
    for your consideration.

    Michael Gevelber, Associate Professor
    Manufacturing Engineering, Boston University

    gevelber@bu.edu 617-353-9693

    ------------------------------------------------------------------------
    ------------------------------

    Process control has provided significant value for a variety of
    important application areas since the beginning of control development.
      While originally focused on chemical processing, it has grown to
    provide enabling capabilities spanning semiconductor, photonic, and
    other materials processing and manufacturing applications. In
    particular, while improving materials processing capabilities continues
    to be of fundamental importance to meeting the manufacturing
    requirements for the next generation of materials, these processing
    problems are increasingly more difficult as we seek to manufacture new
    materials, achieve greater control over material microstructure, and
    meet stringent performance and production requirements.

    The successful development of process control systems for these
    advanced manufacturing and materials processing applications requires
    the application a controls based approach which includes an integrated
    effort of physical modelling, sensor development, system design and
    control development. Design of both the system and control structure
    needs to be conducted with an understanding of the dominant process
    physics. Thus, this research typically involves modeling which provides
    insight into the dominant process physics. A control perspective,
    however, is useful since it provides the basis for determining what
    modeling is important

    The objective of this session is to present the latest process control
    research for a variety of applications that include process modeling,
    dynamics, sensor system development, and control.

    The topics of interest for this session include, but are not limited
    to, the following:
    •Nano-materials processing including electrospinning
    •Coating processes for energy applications such as solar cells, fuel
    cells, and engines; biological applications; and displays. Coating
    processes include chemical and physical vapor deposition processes,
    electron beam, plasma spray.
    •Novel manufacturing processes, such as micro machining
    •Traditional manufacturing processes such as welding and machining
    •Bulk materials processing applications such as crystal growth, silicon
    manufacturing, primary metals
      


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